Tokyo Electron’s new tool can reduce the necessity for EUV double patterning and improve yield
Tokyo Electron unveils the Acrevia tool, which can improve patterning with gas cluster beam technology. Tokyo Electron unveils…
Read MoreTokyo Electron unveils the Acrevia tool, which can improve patterning with gas cluster beam technology. Tokyo Electron unveils…
Read MoreArrow Lake-S is reportedly coming with an NPU, but it isn’t the same NPU equipped in Lunar Lake.…
Read MoreTo help improve AI’s ability to design GPUs, Nvidia is partnering with the Georgia Institute of Technology to…
Read MoreIt turns out that Windows 10 can still run with all of its registry values set to 0—kind…
Read MoreAn alternative option to a standard Xbox controller, the GameSir Kaleid is a worthy upgrade thanks to its…
Read MoreThe 9700X and 9600X chips beat the single-core performance of other comparable chips, but still lag behind in…
Read MoreIn the midst of OpenAI cracking down on developers accessing its AI models through VPNs and other forms…
Read MoreQualcomm and Microsoft are pushing AI features so buyers will buy AI PCs, but many are simply choosing…
Read MoreThe Sabrent USB Type-C 3-Port Gaming Hub for Steam Deck expands that single Type-C port on the handheld…
Read MoreComplete approval of Intel’s Magdeburg fab is still pending, construction set to start in 2025. Complete approval of…
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