ASML mulls Hyper-NA lithography with a higher than 0.7 numerical aperture in 2030s.
ASML mulls Hyper-NA lithography with a higher than 0.7 numerical aperture in 2030s.
ASML explores Hyper-NA chipmaking tools as the next step in shrinking transistors — tools would debut in 2030, but significant technology and cost hurdles remain
